10.14489/td.2015.05.pp.047-050

2015, 05 May

DOI: 10.14489/td.2015.05.pp.047-050

Kostrin D.K.
OPTICAL CONTROL OF THE GAS MIX COMPOSITION IN THE PROCESS OF REACTIVE SPUTTERING
(pp. 47-50)

Abstract. It is analysed the features of the process of thin films deposition by means of reactive sputtering. Reactive magnetron sputtering peculi-arity is the additionof reactive gas into the working camera for directional change of composition of the received coating. Therefore, control of a gas mix composition is a major technological task. It is considered the spectral equipment allowing diagnostics of spectrums of plasma radiation. Arather simple, compact spectrometer witha charge-coupled devicephotosensor element is usedin this work. It is shown possibilities of determinationof gas mix composition on the samplesof argon–oxygen mix while depositing films of tantalum pentoxide. Plasma spectrums in a course of deposition of this coating contain spectral lines of oxygen, argon and othersubstances which complicate its analysis. Therefore, transition to reviewing the most intensive spectral lines in particular spectral line of oxygen with wavelength 777,5 nm that is rather remote from lines of argon is very efficient. Results of experiments show that it is possible to control concentration of oxygen not only on change of intensity of lines of oxygen, but also on the relative change of intensity of lines of argon.

Keywords: reactive sputtering, thin films, optical spectrometer, plasma, gas mix.

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D. K. Kostrin
Saint Petersburg Electrotechnical University “LETI”, Saint Petersburg, Russia. E-mail: Данный адрес e-mail защищен от спам-ботов, Вам необходимо включить Javascript для его просмотра.

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DOI: 10.14489/td.2015.05.pp.047-050

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